製品変更通知
| Change Notification # |
|
4882 |
| Revision |
|
|
| Type of Notification |
|
PRODUCT/PROCESS CHANGE NOTIFICATION |
| Change Title |
|
LCX Process Flow Change |
| Issue Date |
|
1999-07-26 |
| Affected Product Family |
|
DISCRETES AND LOGIC |
| Description |
|
LCX Logic wafers being fabricated at Charter Semiconductor in Singapore, will have the Epitaxial Layer and a Vthreshold adjust Step removed in the present process flow. The circuit design, layout and dimensions are not altered in this change. The EPI layer is used for Latchup prevention and Vth adjust was used for leakage containment in the OVT circuitry. These steps were originally carried over from an earlier process flow in MOS6 fab, and are considered not necessary on CSM design rules. The removal of these 2 steps have been electrically evaluated on another family and shown not to alter the characteristics of the device.
|
| Key Items Affected by Change |
|
Subcontractor Fab Site Wafer Process |
| |
| Key Milestones |
|
| Effective Date: |
|
1999-11-04 |
| Sample Info: |
|
Contact your local Motorola Sales Office |
| Possible Replacements |
|
N/A |
For more information on this Process Change Notification, please
contact your local ON Semiconductor sales office.
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